Semiconductor & PV Process Filters
F8-F9 Grade Medium Efficiency Air Filters
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Description:
F8-F9 grade medium efficiency filters supply clean cooling air or purge gas to process chambers that come into direct contact with wafers or solar cells, effectively preventing particulate contamination generated by moving internal equipment components from interfering with manufacturing processes. In accordance with EN 779 / ISO 16890 standards, their filtration efficiency for particles ≥0.4 μm reaches ≥75% (F8) and ≥85% (F9) respectively.
Core Technical Advantages:
Compact and modular design: Optimized for limited internal equipment space, typically only 25–50 mm thick, compatible with standard slot mounting for FFUs or equipment air inlets.
Low pressure drop and high dust holding capacity: Compared with standard HVAC filters of the same size, optimized filter media pleat height and spacing reduce fan power consumption while maintaining F9 efficiency.
Chemical corrosion resistance and low outgassing: Filter media and sealants adopt low-VOC materials, resisting trace acid and alkaline gases in process environments to eliminate secondary contamination risks.
Optional all-metal high-temperature resistant structure: For high-temperature equipment such as PECVD, all-stainless steel frames with metal corrugated or aluminum foil separators are available for continuous operation at 120–150°C.
Working Condition Matching Table
| Equipment Type | Equipment Function | Recommended Grade | Key Requirements |
| Lithography machine projection objective lens | Constant temperature & humidity gas purge inside lens | F9 | Ultra-low pressure drop, uniform face velocity |
| Coater & Developer Track Equipment | SMIF Pod purge for wafer cassettes | F8 | Low metal ion leaching |
| Plasma Etcher | Air intake for reaction chamber cooling duct | F8 | Plasma gas corrosion resistance |
| PECVD | Chamber purge for preheating module | F9 | All stainless steel, temperature resistance ≥120°C |
| Diffusion / Oxidation Furnace | Clean air curtain at furnace mouth | F8 | Compact slot-mounted design |
Application Fields:
Semiconductor front-end process equipment
Semiconductor lithography equipment
Semiconductor vacuum pump and exhaust gas treatment systems
PV cell manufacturing equipment
PECVD equipment
PV cell sintering furnaces
Case & Data Verification
Custom compact F9 filters with optimized pleat patterns were supplied for the lens purge system of a lithography equipment manufacturer, boosting dust holding capacity by 40%. The replacement cycle was extended from 3–4 months to 10 months, reducing equipment downtime frequency.
FAQ:
Q: Can equipment-grade F9 filters replace H13 HEPA filters?
A: No. Equipment F9 filters are mainly used for scenarios requiring ISO Class 7–8 cleanliness such as cooling and purging. H13 HEPA filters are adopted for wafer transport or chemical filtration with strict particle control standards. Selection shall comply with the equipment’s particle control specifications.
Q: How to verify the performance of equipment filters?
A: On-site scanning leak testing can be conducted to check sealing performance after installation. Inline particle counters can also be fitted to monitor downstream gas cleanliness in real time.
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