Semiconductor & PV Process Filters
Alumina Powder Filter Cartridge
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Description:
Alumina (Al₂O₃) filter cartridges are installed on circulating chemical liquid pipelines of wet cleaning stations, single wafer cleaning equipment, Chemical Mechanical Polishing (CMP) equipment, as well as photovoltaic texturing and etching equipment. They can online filter particles, gels or microbubbles in process chemicals (such as SC1, SC2, HF, CMP slurry) to protect wafer or solar cell surfaces from damage and extend the single-batch service life of chemicals.
Core Technical Advantages:
High-precision surface filtration to eliminate micro-particle shedding: Adopting multi-layer alumina particle sintering process to form a stable gradient pore structure, it delivers high filtration precision with zero fiber shedding, completely solving the fiber migration issue of traditional depth filter membranes (such as PES) during initial use.
Ultra-low leaching of metal ions and organics: Treated by ultrapure water circulation pre-rinsing process, the filter cartridges are fully pre-flushed before delivery. The leaching concentration of key metal ions drops below 0.1 ppb within 24 hours after startup.
Excellent corrosion resistance: Made of alumina with strong chemical inertness, the cartridge body features no swelling or aging risks for extreme processes containing HF or other strong acids.
Working Condition Matching Table
| Equipment Type | Application Position | Recommended Rating | Key Technical Requirements |
| Single Wafer Wet Cleaning Equipment | Chemical supply pipeline (primary filtration) | 0.1 µm | Ultra-low metal ion leaching, compatible with online backwashing |
| Batch Wet Cleaning Station | Chemical liquid circulation filter loop | 0.2 µm | Strong acid resistance, high flow rate, long service life |
| Chemical Mechanical Polishing Equipment | Online filtration for CMP slurry | 0.5 µm | High shear strength, no abrasive particle adsorption, wear resistant |
| Photovoltaic Texturing Equipment | Circulation filtration for KOH/IPA texturing solution | 0.5 µm | IPA corrosion resistance, high temperature resistance |
| Photovoltaic Etching Equipment | Filtration for HF/HNO₃ mixed acid etching solution | 0.2 µm | Resistant to harsh mixed strong acids |
Application Fields:
Semiconductor wet processing equipment
Semiconductor single wafer cleaners
Semiconductor chemical mechanical polishing systems
Semiconductor batch cleaning stations
Photovoltaic cell wet processing equipment
PV wafer texturing machines
PSG (Phosphosilicate Glass) removal etchers
Case & Data Verification:
Custom 0.1µm high-purity alumina filter cartridges with circulation flushing were supplied for single wafer cleaning equipment of a wafer fab. The product effectively solved excessive particle contamination and increasing gate oxide defects during single wafer cleaning. After replacement, the service life of filter cartridges was extended from 2 weeks to 3 months, and the replacement frequency of chemical tanks was reduced from weekly to monthly.
FAQ:
Q: How to determine when an alumina filter cartridge needs replacement?
A: Monitor the differential pressure across the filter cartridge. Replacement is required when the differential pressure reaches the preset upper limit (normally 0.2–0.3 MPa) and cannot be effectively recovered by online backwashing.
Q: Is special pre-treatment required before using alumina filter cartridges?
A: Yes. Sufficient circulation flushing with matching process chemicals or ultrapure water is mandatory to remove trace residual metal ions and air bubbles generated during production.
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