Semiconductor & PV Process Filters

Alumina Powder Filter Cartridge

Filter Manufacturer Safe & Reliable Long Lasting & Stable Customizable
Alumina (Al₂O₃) filter cartridges are mounted on the circulating chemical liquid pipelines of wet cleaning stations, single wafer cleaning equipment, Chemical Mechanical Polishing (CMP) machines, as well as photovoltaic texturing and etching equipment. They can online filter particles, gels and microbubbles from process chemicals (e.g., SC1, SC2, HF, CMP slurry) to protect wafer and solar cell surfaces against damage, while extending the service life of chemicals per single batch.

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Description:

Alumina (Al₂O₃) filter cartridges are installed on circulating chemical liquid pipelines of wet cleaning stations, single wafer cleaning equipment, Chemical Mechanical Polishing (CMP) equipment, as well as photovoltaic texturing and etching equipment. They can online filter particles, gels or microbubbles in process chemicals (such as SC1, SC2, HF, CMP slurry) to protect wafer or solar cell surfaces from damage and extend the single-batch service life of chemicals.

Core Technical Advantages:

High-precision surface filtration to eliminate micro-particle shedding: Adopting multi-layer alumina particle sintering process to form a stable gradient pore structure, it delivers high filtration precision with zero fiber shedding, completely solving the fiber migration issue of traditional depth filter membranes (such as PES) during initial use.

Ultra-low leaching of metal ions and organics: Treated by ultrapure water circulation pre-rinsing process, the filter cartridges are fully pre-flushed before delivery. The leaching concentration of key metal ions drops below 0.1 ppb within 24 hours after startup.

Excellent corrosion resistance: Made of alumina with strong chemical inertness, the cartridge body features no swelling or aging risks for extreme processes containing HF or other strong acids.

Working Condition Matching Table

Equipment TypeApplication PositionRecommended RatingKey Technical Requirements
Single Wafer Wet Cleaning EquipmentChemical supply pipeline (primary filtration)0.1 µmUltra-low metal ion leaching, compatible with online backwashing
Batch Wet Cleaning StationChemical liquid circulation filter loop0.2 µmStrong acid resistance, high flow rate, long service life
Chemical Mechanical Polishing EquipmentOnline filtration for CMP slurry0.5 µmHigh shear strength, no abrasive particle adsorption, wear resistant
Photovoltaic Texturing EquipmentCirculation filtration for KOH/IPA texturing solution0.5 µmIPA corrosion resistance, high temperature resistance
Photovoltaic Etching EquipmentFiltration for HF/HNO₃ mixed acid etching solution0.2 µmResistant to harsh mixed strong acids

Application Fields:

Semiconductor wet processing equipment

Semiconductor single wafer cleaners

Semiconductor chemical mechanical polishing systems

Semiconductor batch cleaning stations

Photovoltaic cell wet processing equipment

PV wafer texturing machines

PSG (Phosphosilicate Glass) removal etchers

Case & Data Verification:

Custom 0.1µm high-purity alumina filter cartridges with circulation flushing were supplied for single wafer cleaning equipment of a wafer fab. The product effectively solved excessive particle contamination and increasing gate oxide defects during single wafer cleaning. After replacement, the service life of filter cartridges was extended from 2 weeks to 3 months, and the replacement frequency of chemical tanks was reduced from weekly to monthly.

FAQ:

Q: How to determine when an alumina filter cartridge needs replacement?

A: Monitor the differential pressure across the filter cartridge. Replacement is required when the differential pressure reaches the preset upper limit (normally 0.2–0.3 MPa) and cannot be effectively recovered by online backwashing.

Q: Is special pre-treatment required before using alumina filter cartridges?

A: Yes. Sufficient circulation flushing with matching process chemicals or ultrapure water is mandatory to remove trace residual metal ions and air bubbles generated during production.


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